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Chem Commun (Camb)


Title:Surface oxygen vacancy defect engineering of p-CuAlO(2)via Ar&H(2) plasma treatment for enhancing VOCs sensing performances
Author(s):Tong B; Meng G; Deng Z; Horprathum M; Klamchuen A; Fang X;
Address:"Anhui Provincial Key Laboratory of Photonic Devices and Materials, Anhui Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Hefei, 230031, China. menggang@aiofm.ac.cn xdfang@aiofm.ac.cn and University of Science and Technology of China, Hefei 230026, China. Anhui Provincial Key Laboratory of Photonic Devices and Materials, Anhui Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Hefei, 230031, China. menggang@aiofm.ac.cn xdfang@aiofm.ac.cn and Key Lab of Photovoltaic and Energy Conservation Materials, Chinese Academy of Sciences, Hefei 230031, China. Opto-Electrochemical Sensing Research Team, National Electronic and Computer Technology Center, Pathum Thani 12120, Thailand. National Nanotechnology Center, National Science and Technology Development Agency, Pathum Thani 12120, Thailand"
Journal Title:Chem Commun (Camb)
Year:2019
Volume:55
Issue:78
Page Number:11691 - 11694
DOI: 10.1039/c9cc05881h
ISSN/ISBN:1364-548X (Electronic) 1359-7345 (Linking)
Abstract:"Ar&H2 plasma treatment was proposed to enhance the response of a p-CuAlO2 sensor toward volatile organic compounds. Comprehensive defect characterization studies indicate a substantial increase of surface unsaturated oxygen vacancy (VO) defects via plasma treatment, which could provide active sites for molecule adsorption and the subsequent interfacial redox reaction"
Keywords:
Notes:"PubMed-not-MEDLINETong, Bin Meng, Gang Deng, Zanhong Horprathum, Mati Klamchuen, Annop Fang, Xiaodong eng England 2019/09/12 Chem Commun (Camb). 2019 Sep 26; 55(78):11691-11694. doi: 10.1039/c9cc05881h"

 
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