Title: | In Situ Time-of-Flight Mass Spectrometry of Ionic Fragments Induced by Focused Electron Beam Irradiation: Investigation of Electron Driven Surface Chemistry inside an SEM under High Vacuum |
Author(s): | Jurczyk J; Pillatsch L; Berger L; Priebe A; Madajska K; Kapusta C; Szymanska IB; Michler J; Utke I; |
Address: | "Laboratory for Mechanics of Materials and Nanostructures, Empa-Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland. Faculty of Physics and Applied Computer Science, AGH University of Science and Technology Krakow, Al. Mickiewicza 30, 30-059 Krakow, Poland. TOFWERK AG, Schorenstrasse 39, CH-3645 Thun, Switzerland. Faculty of Chemistry, Nicolaus Copernicus University in Torun, Gagarina 7, 87-100 Torun, Poland" |
ISSN/ISBN: | 2079-4991 (Print) 2079-4991 (Electronic) 2079-4991 (Linking) |
Abstract: | "Recent developments in nanoprinting using focused electron beams have created a need to develop analysis methods for the products of electron-induced fragmentation of different metalorganic compounds. The original approach used here is termed focused-electron-beam-induced mass spectrometry (FEBiMS). FEBiMS enables the investigation of the fragmentation of electron-sensitive materials during irradiation within the typical primary electron beam energy range of a scanning electron microscope (0.5 to 30 keV) and high vacuum range. The method combines a typical scanning electron microscope with an ion-extractor-coupled mass spectrometer setup collecting the charged fragments generated by the focused electron beam when impinging on the substrate material. The FEBiMS of fragments obtained during 10 keV electron irradiation of grains of silver and copper carboxylates and shows that the carboxylate ligand dissociates into many smaller volatile fragments. Furthermore, in situ FEBiMS was performed on carbonyls of ruthenium (solid) and during electron-beam-induced deposition, using tungsten carbonyl (inserted via a gas injection system). Loss of carbonyl ligands was identified as the main channel of dissociation for electron irradiation of these carbonyl compounds. The presented results clearly indicate that FEBiMS analysis can be expanded to organic, inorganic, and metal organic materials used in resist lithography, ice (cryo-)lithography, and focused-electron-beam-induced deposition and becomes, thus, a valuable versatile analysis tool to study both fundamental and process parameters in these nanotechnology fields" |
Keywords: | FEBID (Focused electron beam induced deposition) FEBiMS TOFSIMS (Time-of-flight secondary ions mass spectrometry) electron induced fragmentation ice lithography ion extractor lithography mass spectrometry metalorganic compounds; |
Notes: | "PubMed-not-MEDLINEJurczyk, Jakub Pillatsch, Lex Berger, Luisa Priebe, Agnieszka Madajska, Katarzyna Kapusta, Czeslaw Szymanska, Iwona B Michler, Johann Utke, Ivo eng 722149/EU Horizon 2020 Marie Curie-Sklodowska Innovative Training Network 'ELENA'/ GA 872494/European Union's Horizon 2020 research and innovation programme - the RADON/ 200021E- 164211/SNSF_/Swiss National Science Foundation/Switzerland 25592.1PFNM-NM/Swiss Commission for Technology and Innovation (CTI)/ PDB 103/Nicolaus Copernicus University in Torun/ Switzerland 2022/08/13 Nanomaterials (Basel). 2022 Aug 6; 12(15):2710. doi: 10.3390/nano12152710" |