| Title: | Organoselenium Precursors for Atomic Layer Deposition |
| Author(s): | Charvot J; Zazpe R; Macak JM; Bures F; |
| Address: | "Institute of Organic Chemistry and Technology, Faculty of Chemical Technology, University of Pardubice, Studentska 573, Pardubice 53210, Czech Republic. Center of Materials and Nanotechnologies, Faculty of Chemical Technology, University of Pardubice, Nam. Cs. Legii 565, Pardubice 53002, Czech Republic. Central European Institute of Technology, Brno University of Technology, Purkynova 123, Brno 61200, Czech Republic" |
| ISSN/ISBN: | 2470-1343 (Electronic) 2470-1343 (Linking) |
| Abstract: | "Organoselenium compounds with perspective application as Se precursors for atomic layer deposition have been reviewed. The originally limited portfolio of available Se precursors such as H(2)Se and diethyl(di)selenide has recently been extended by bis(trialkylsilyl)selenides, bis(trialkylstannyl)selenides, cyclic selenides, and tetrakis(N,N-dimethyldithiocarbamate)selenium. Their structural aspects, property tuning, fundamental properties, and preparations are discussed. It turned out that symmetric four- and six-membered cyclic silyl selenides possess well-balanced reactivity/stability, facile and cost-effective synthesis starting from inexpensive and readily available chlorosilanes, improved resistance toward air and moisture, easy handling, sufficient volatility, thermal resistance, and complete gas-to-solid phase exchange reaction with MoCl(5), affording MoSe(2) nanostructures. These properties make them the most promising Se precursor developed for atomic layer deposition so far" |
| Notes: | "PubMed-not-MEDLINECharvot, Jaroslav Zazpe, Raul Macak, Jan M Bures, Filip eng Review 2021/03/23 ACS Omega. 2021 Mar 4; 6(10):6554-6558. doi: 10.1021/acsomega.1c00223. eCollection 2021 Mar 16" |
